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Some Properties of TiC Film Deposited on SUS 316L by Ion Plating Method
https://doi.org/10.57375/00000639
https://doi.org/10.57375/00000639c1dd6126-3ca1-41c0-a46b-4ccfa88622c8
名前 / ファイル | ライセンス | アクション |
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Item type | 紀要論文 / Departmental Bulletin Paper(1) | |||||
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公開日 | 2009-04-10 | |||||
タイトル | ||||||
タイトル | Some Properties of TiC Film Deposited on SUS 316L by Ion Plating Method | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | departmental bulletin paper | |||||
ID登録 | ||||||
ID登録 | 10.57375/00000639 | |||||
ID登録タイプ | JaLC | |||||
著者 |
SAITO, Kiichi
× SAITO, Kiichi |
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抄録 | ||||||
内容記述タイプ | Abstract | |||||
内容記述 | Evaluetion was made on properties of TiC film, which vas coated on the surface of SUS 316L stainless steel by ion plat.ing(IP). As the result. It was found that the thickness of film can be given as linear function of the time of processing and film hardness as linear function of film thickness. In early stage of growth, film shows epi t.axial growth along crystal orientation of the SUS 316L substrate. In TiC/SuS 316L interface, orientation of (001).., / (110)_<TIS> vas observed. With the increase of the film thickness. There is a trend that growth along a specific orientation of higher degree becomes dominant. | |||||
書誌情報 |
福井工業大学研究紀要. 第一部 号 24, p. 95-101, 発行日 1994-03-22 |
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出版者 | ||||||
出版者 | 福井工業大学 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 2868571 | |||||
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識別子タイプ | NCID | |||||
関連識別子 | TF00009098 | |||||
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出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 |