{"created":"2023-06-20T13:43:01.080821+00:00","id":645,"links":{},"metadata":{"_buckets":{"deposit":"19715c16-59fd-49fa-adfa-00a4b779dae4"},"_deposit":{"created_by":2,"id":"645","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"645"},"status":"published"},"_oai":{"id":"oai:fut.repo.nii.ac.jp:00000645","sets":["1"]},"author_link":["10694"],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"1994-03-22","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"24","bibliographicPageEnd":"101","bibliographicPageStart":"95","bibliographic_titles":[{"bibliographic_title":"福井工業大学研究紀要. 第一部"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"Evaluetion was made on properties of TiC film, which vas coated on the surface of SUS 316L stainless steel by ion plat.ing(IP). As the result. It was found that the thickness of film can be given as linear function of the time of processing and film hardness as linear function of film thickness. In early stage of growth, film shows epi t.axial growth along crystal orientation of the SUS 316L substrate. In TiC/SuS 316L interface, orientation of (001).., / (110)_<TIS> vas observed. With the increase of the film thickness. There is a trend that growth along a specific orientation of higher degree becomes dominant.","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.57375/00000639","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"福井工業大学"}]},"item_10002_relation_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"TF00009098","subitem_relation_type_select":"NCID"}}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"2868571","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"SAITO, Kiichi"}],"nameIdentifiers":[{"nameIdentifier":"10694","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-04-12"}],"displaytype":"detail","filename":"KJ00000201663.pdf","filesize":[{"value":"693.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KJ00000201663.pdf","url":"https://fut.repo.nii.ac.jp/record/645/files/KJ00000201663.pdf"},"version_id":"11c1a717-3d1a-4c23-9724-17e01e85b29f"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Some Properties of TiC Film Deposited on SUS 316L by Ion Plating Method","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Some Properties of TiC Film Deposited on SUS 316L by Ion Plating Method"}]},"item_type_id":"10002","owner":"2","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-04-10"},"publish_date":"2009-04-10","publish_status":"0","recid":"645","relation_version_is_last":true,"title":["Some Properties of TiC Film Deposited on SUS 316L by Ion Plating Method"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-06-20T14:28:12.472123+00:00"}