{"created":"2023-06-20T13:43:14.982730+00:00","id":952,"links":{},"metadata":{"_buckets":{"deposit":"c634273a-6619-43b9-923e-e26ca795ef9d"},"_deposit":{"created_by":2,"id":"952","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"952"},"status":"published"},"_oai":{"id":"oai:fut.repo.nii.ac.jp:00000952","sets":["1"]},"author_link":["11762","11761","11765","11767","11766","11760","11764","11763"],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2009-08-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"39","bibliographicPageEnd":"160","bibliographicPageStart":"153","bibliographic_titles":[{}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"The authors proposed a novel chemical vapor deposition system, new evaporation supply method by using flash boiling spray, to improve several kinds of problem such as decomposition of precursor at supply line and evaporator. In the experiment, tetraethyl methyl amino hafnium was used as high boiling point precursor and n-pentane was used as low boiling point organic solvent. HfO2 film was deposited on Si substrate by using this method. And effect of injection quantity on the HfO2 film surface was examined. As the result, flash boiling is stopped because excess mixed solution is supplied and the contamination is increased as increasing injection quantity.","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.57375/00000946","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"福井工業大学"}]},"item_10002_relation_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"TF00009405","subitem_relation_type_select":"NCID"}}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"18844502 / 18844456","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"大嶋, 元啓"}],"nameIdentifiers":[{"nameIdentifier":"11760","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"木村, 大一郎"}],"nameIdentifiers":[{"nameIdentifier":"11761","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"千田, 二郎"}],"nameIdentifiers":[{"nameIdentifier":"11762","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"石田, 耕三"}],"nameIdentifiers":[{"nameIdentifier":"11763","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"OSHIMA, Motohiro","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11764","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"KIMURA, Daiichiro","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11765","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"SENDA, Jiro","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11766","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"ISHIDA, Kozo","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"11767","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-04-12"}],"displaytype":"detail","filename":"kiyou3921.pdf","filesize":[{"value":"7.4 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kiyou3921.pdf","url":"https://fut.repo.nii.ac.jp/record/952/files/kiyou3921.pdf"},"version_id":"ca481a10-21c3-4dc1-ab61-4aa00fea7a28"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"薄膜","subitem_subject_scheme":"Other"},{"subitem_subject":"減圧沸騰噴霧","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"減圧沸騰噴霧を適用した新気化供給法により成膜したHfO2薄膜の観察-噴射量が薄膜表面に与える影響-","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"減圧沸騰噴霧を適用した新気化供給法により成膜したHfO2薄膜の観察-噴射量が薄膜表面に与える影響-"},{"subitem_title":"Observation of HfO2 Film Deposited with New Evaporation Supply Method by Using Flash Boiling Spray -Effect of Injection Quantity on the Film Surface-","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"2","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-12-01"},"publish_date":"2009-12-01","publish_status":"0","recid":"952","relation_version_is_last":true,"title":["減圧沸騰噴霧を適用した新気化供給法により成膜したHfO2薄膜の観察-噴射量が薄膜表面に与える影響-"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-06-20T14:22:03.404920+00:00"}