{"created":"2023-06-20T13:42:51.144379+00:00","id":436,"links":{},"metadata":{"_buckets":{"deposit":"72bcdd3d-d013-4fe2-add3-85e61abcdb37"},"_deposit":{"created_by":2,"id":"436","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"436"},"status":"published"},"_oai":{"id":"oai:fut.repo.nii.ac.jp:00000436","sets":["1"]},"author_link":["9955","9954"],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2003-03-20","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"33","bibliographicPageEnd":"303","bibliographicPageStart":"297","bibliographic_titles":[{"bibliographic_title":"福井工業大学研究紀要. 第一部"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In this paper we propose a simple method to ionize sputtered Ti and added oxygen gas, by inserting a heating probe into the plasma space. The effect of bias voltage applied to the heating probe on the crystalline structure and optical properties was investigated for the TiO_2 films deposited by reactive sputtering using this method. In the films deposited with the heating probe applying positive bias voltage to the substrate, the rutile phase was grown on the Si(111) substrate at a low temperature, and this film showed better optical properties than the films prepared without bias voltage. These changes in crystalline and optical properties were attributed to the ionization and acceleration of Ti and oxygen particles.","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.57375/00000430","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"福井工業大学"}]},"item_10002_relation_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"TF00008889","subitem_relation_type_select":"NCID"}}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"2868571","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"柴田, 明"}],"nameIdentifiers":[{"nameIdentifier":"9954","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shibata, Akira","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"9955","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-04-12"}],"displaytype":"detail","filename":"KJ00004279715.pdf","filesize":[{"value":"469.6 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KJ00004279715.pdf","url":"https://fut.repo.nii.ac.jp/record/436/files/KJ00004279715.pdf"},"version_id":"9c8bb0f0-bbd9-4282-a492-4e078f33ee4e"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"プラズマ中の活性粒子を用いた TiO_2 スパッタ膜の形成","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"プラズマ中の活性粒子を用いた TiO_2 スパッタ膜の形成"},{"subitem_title":"TiO_2 Sputtered Film Growth using Active particles in Plasma","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"2","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-04-04"},"publish_date":"2009-04-04","publish_status":"0","recid":"436","relation_version_is_last":true,"title":["プラズマ中の活性粒子を用いた TiO_2 スパッタ膜の形成"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-06-20T14:32:33.143050+00:00"}