{"created":"2023-06-20T13:42:41.526798+00:00","id":252,"links":{},"metadata":{"_buckets":{"deposit":"f84e5ee8-67aa-4e8e-82cf-5a784077387c"},"_deposit":{"created_by":2,"id":"252","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"252"},"status":"published"},"_oai":{"id":"oai:fut.repo.nii.ac.jp:00000252","sets":["1"]},"author_link":["9318","9319"],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2004-03-20","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"34","bibliographicPageEnd":"274","bibliographicPageStart":"267","bibliographic_titles":[{"bibliographic_title":"福井工業大学研究紀要. 第一部"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In this paper we propose a simple method to ionize sputtered Ti and added oxygen gas by introducing He gas in reactive sputtering. Rutile (110) rich TiO_2 films were prepared at a low temperature by using this method. The optimum gas pressure ratio providing the richest rutile composition to deposited film was He: O_2: Ar=1: 0.42: 2.39 for a total gas pressure of 0.27 Pa. The rutile (110) phase was grown by the reaction between sputtered Ti and active oxygen species O_2^+, O^*. The former is generated by the penning ionization of oxygen molecules by He^*. The latter is produced from the decomposition process of O_2^+. This film indicated the greatest crystalline size and the highest refractive index. Furthermore, the film consists of the uniform crystalline sizes of 20～30 nm.","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.57375/00000246","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"福井工業大学"}]},"item_10002_relation_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"TF00008705","subitem_relation_type_select":"NCID"}}]},"item_10002_source_id_9":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"2868571","subitem_source_identifier_type":"ISSN"}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"柴田, 明"}],"nameIdentifiers":[{"nameIdentifier":"9318","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Shibata, Akira","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"9319","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-04-12"}],"displaytype":"detail","filename":"KJ00004259139.pdf","filesize":[{"value":"539.9 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KJ00004259139.pdf","url":"https://fut.repo.nii.ac.jp/record/252/files/KJ00004259139.pdf"},"version_id":"5f56865e-00b9-48ad-9f1d-f637fa368ac4"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"プラズマ中の活性粒子を用いたTiO_2スパッタ膜の形成(II)","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"プラズマ中の活性粒子を用いたTiO_2スパッタ膜の形成(II)"},{"subitem_title":"TIO_2 Sputtered Film Growth using Active particles in Plasma (II)","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"2","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2009-04-04"},"publish_date":"2009-04-04","publish_status":"0","recid":"252","relation_version_is_last":true,"title":["プラズマ中の活性粒子を用いたTiO_2スパッタ膜の形成(II)"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-06-20T14:36:28.853517+00:00"}