{"created":"2023-06-20T13:43:20.479302+00:00","id":1072,"links":{},"metadata":{"_buckets":{"deposit":"98c16421-1040-43cd-a5a6-b2f3b8228074"},"_deposit":{"created_by":2,"id":"1072","owners":[2],"pid":{"revision_id":0,"type":"depid","value":"1072"},"status":"published"},"_oai":{"id":"oai:fut.repo.nii.ac.jp:00001072","sets":["1"]},"author_link":["12349","12348"],"item_10002_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2010-06-30","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"40","bibliographicPageEnd":"16","bibliographicPageStart":"7","bibliographic_titles":[{"bibliographic_title":"福井工業大学研究紀要"}]}]},"item_10002_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"When applying plasma, many different plasma conditions such as the case where a low electron temperature is required, the case which is uniform in the wide area of the plasma electron density are required. To create plasma, the plasma control parameter of sample gas pressure p, ionizing voltage Vs or ionizing electric power Pa is important. Moreover, it is necessary to investigate a basic plasma parameter of the electron temperature Te and electron density Ne of the generated plasma. In this paper, examining relation between the plasma control parameter and plasma parameter experimentally is reported.","subitem_description_type":"Abstract"}]},"item_10002_identifier_registration":{"attribute_name":"ID登録","attribute_value_mlt":[{"subitem_identifier_reg_text":"10.57375/00001066","subitem_identifier_reg_type":"JaLC"}]},"item_10002_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"福井工業大学"}]},"item_10002_relation_11":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_relation_type_id":{"subitem_relation_type_id_text":"TF00009525","subitem_relation_type_select":"NCID"}}]},"item_10002_version_type_20":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"長濱, 治男"}],"nameIdentifiers":[{"nameIdentifier":"12348","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Nagahama, Haruo","creatorNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"12349","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2023-04-12"}],"displaytype":"detail","filename":"kiyou4002.pdf","filesize":[{"value":"5.5 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kiyou4002.pdf","url":"https://fut.repo.nii.ac.jp/record/1072/files/kiyou4002.pdf"},"version_id":"ce66da47-b469-41a6-abe8-500faee1742c"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"High frequency discharge","subitem_subject_scheme":"Other"},{"subitem_subject":"plasma","subitem_subject_scheme":"Other"},{"subitem_subject":"sample gas pressure","subitem_subject_scheme":"Other"},{"subitem_subject":"ionization electric power","subitem_subject_scheme":"Other"},{"subitem_subject":"electron density","subitem_subject_scheme":"Other"},{"subitem_subject":"electron temperature","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"低気圧誘導結合型高周波放電プラズマのプラズマ制御パラメーターとプラズマパラメーターに関する研究(そ","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"低気圧誘導結合型高周波放電プラズマのプラズマ制御パラメーターとプラズマパラメーターに関する研究(そ"},{"subitem_title":"Experimental Studies on the Relation between the Plasma Control Parameter and Plasma Parameter of Inductively Coupled R.F. Discharge in the Low Pressure (Part 1)","subitem_title_language":"en"}]},"item_type_id":"10002","owner":"2","path":["1"],"pubdate":{"attribute_name":"公開日","attribute_value":"2010-07-24"},"publish_date":"2010-07-24","publish_status":"0","recid":"1072","relation_version_is_last":true,"title":["低気圧誘導結合型高周波放電プラズマのプラズマ制御パラメーターとプラズマパラメーターに関する研究(そ"],"weko_creator_id":"2","weko_shared_id":-1},"updated":"2023-06-20T14:20:23.261208+00:00"}