2026-03-14T02:14:42Z https://fut.repo.nii.ac.jp/oai

oai:fut.repo.nii.ac.jp:00001032 2023-06-20T14:20:56Z 1

減圧沸騰噴霧を適用した新気化供給法の提案 -HfO2膜表面構造におよぼす噴射量の影響- Proposal of New Supplying Evaporation Precursor Method with CVD by Using Mixed Solution – Relation between HfO2 Film Surface Condition and Injection Quantity – 大嶋, 元啓 千田, 二郎 石田, 耕三 OSHIMA, Motohiro SENDA, Jiro ISHIDA, Kozo CVD flash boiling spray HfO2 SEM TEMAHf The authors proposed a novel chemical vapor deposition system, a new evaporation supply method by using flash boiling spray, to improve several kinds of problems such as decomposition of precursor at supply line and evaporator. In this method, liquid precursors are supplied directly to vacuum chamber thorough an injector without vaporizers. The technique to improve the vaporization of pressure is proposed by mixing a higher saturated vapor pressure organic solvent because the saturated pressure of precursor is very low. In this paper, relation between film surface condition and injection quantity was investigated. Tetraethyl methyl amino hafnium and n-pentane were used as mixed solution, and HfO2 film was deposited on Si substrate by using this method. As a result, the film surface roughness and grain size are increased as increasing injection quantity. 福井工業大学 2010-06-30 jpn departmental bulletin paper VoR https://doi.org/10.57375/00001026 https://fut.repo.nii.ac.jp/records/1032 10.57375/00001026 TF00009485 福井工業大学研究紀要 40 125 131 https://fut.repo.nii.ac.jp/record/1032/files/kiyou4016.pdf application/pdf 6.7 MB 2023-04-12